from typing import Dict, List, Tuple
STANDARD_RECIPES: Dict[str, Dict[str, Dict[str, str]]] = {
"etch": {
"poly_si": {
"chuck_temp": "60 °C",
"pressure": "10 mTorr",
"rf_power": "600 W",
"bias_power": "120 W",
"cl2_flow": "80 sccm",
"hbr_flow": "40 sccm",
"ar_flow": "100 sccm",
"time": "45 s",
},
"metal": {
"chuck_temp": "50 °C",
"pressure": "6 mTorr",
"rf_power": "450 W",
"bias_power": "160 W",
"bcl3_flow": "35 sccm",
"cl2_flow": "70 sccm",
"ar_flow": "120 sccm",
"time": "55 s",
},
},
"deposition": {
"ild_cvd": {
"temp": "380 °C",
"pressure": "3 Torr",
"precursor": "TEOS",
"o2_flow": "600 sccm",
"he_flow": "1000 sccm",
"rf_power": "250 W",
"thickness": "800 nm",
},
"metal_pvd": {
"temp": "120 °C",
"pressure": "4 mTorr",
"target": "AlCu",
"ar_flow": "60 sccm",
"dc_power": "8 kW",
"thickness": "500 nm",
},
},
"lithography": {
"contact": {
"resist": "193i CAR",
"post_apply_bake": "110 °C / 60 s",
"exposure_dose": "22 mJ/cm²",
"focus_offset": "0.00 µm",
"post_exposure_bake": "95 °C / 60 s",
"develop": "TMAH 2.38% / 60 s",
},
"line_space": {
"resist": "EUV CAR",
"post_apply_bake": "120 °C / 60 s",
"exposure_dose": "27 mJ/cm²",
"focus_offset": "0.02 µm",
"post_exposure_bake": "95 °C / 60 s",
"develop": "TMAH 2.38% / 55 s",
},
},
"cmp": {
"ild": {
"head_pressure": "3.0 psi",
"platen_speed": "60 rpm",
"slurry_flow": "200 ml/min",
"backpressure": "0.2 psi",
"pad_temp": "28 °C",
"removal_rate": "120 nm/min",
},
"copper": {
"head_pressure": "2.5 psi",
"platen_speed": "70 rpm",
"slurry_flow": "180 ml/min",
"backpressure": "0.25 psi",
"pad_temp": "30 °C",
"removal_rate": "150 nm/min",
},
},
"implant": {
"n_well": {
"species": "Phosphorus",
"energy": "60 keV",
"dose": "2e13 cm^-2",
"tilt": "7 °",
"twist": "27 °",
},
"p_well": {
"species": "Boron",
"energy": "20 keV",
"dose": "5e12 cm^-2",
"tilt": "7 °",
"twist": "27 °",
},
},
}
# Allowable windows for selected parameters; (low, high, unit)
PROCESS_WINDOWS: Dict[str, Dict[str, Dict[str, Tuple[float, float, str]]]] = {
"etch": {
"poly_si": {
"pressure": (8, 12, "mTorr"),
"rf_power": (550, 650, "W"),
"bias_power": (100, 140, "W"),
},
"metal": {
"pressure": (5, 8, "mTorr"),
"rf_power": (420, 500, "W"),
"bias_power": (140, 180, "W"),
},
},
"lithography": {
"contact": {
"exposure_dose": (21, 23, "mJ/cm²"),
"focus_offset": (-0.02, 0.02, "µm"),
},
"line_space": {
"exposure_dose": (26, 28, "mJ/cm²"),
"focus_offset": (-0.015, 0.035, "µm"),
},
},
"cmp": {
"copper": {
"head_pressure": (2.2, 2.8, "psi"),
"platen_speed": (60, 80, "rpm"),
"slurry_flow": (160, 200, "ml/min"),
}
},
}
